About Implantation (English version)

We have equipment for ion implantation and thermal process.

In addition to ion implantation at room temperature, high-temperature ion implantation that only several companies in the world can handle boasts top-level technology and equipment.
At our company, a wide variety of samples from chips to 12-inch diameter wafers and injection processing under various conditions are possible according to the customer's request. Implantation conditions are from 10 to 8,000 KeV, from room temperature to high-temperature heating (600 C), and about 60 ion species are available.