株式会社イオンテクノセンター
最終更新日:2020-02-24 21:03:00.0
Semiconductor One Stop Annealing Service_ (English version)
基本情報Semiconductor One Stop Annealing Service_ (English version)
One-stop service for annealing as well as ion implantation
In SiC semiconductors, high-temperature annealing for dopant activation is essential. The annealing temperature is high, so surface protection with a cap film before annealing is required. We can support high-temperature annealing as well as carbon cap film deposition and removal.
取扱会社 Semiconductor One Stop Annealing Service_ (English version)
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