株式会社イオンテクノセンター Implantation Simulation
- 最終更新日：2020-03-10 17:08:41.0
- 印刷用ページ
Customer's request "How much energy and dose should be used to achieve the desired depth and concentration?" And "What depth distribution of dopant ions will be given at the specified energy and dose." , We can provide a simulation. (This service presupposes a request for ion implantation.)
基本情報Implantation Simulation
Ion implantation simulation
・ Single profile
Calculation implantation conditions from depth and concentration
・ Box profile
Calculation of multi-step implantation conditions
Other simulations
・ Diffusion after heat treatment
Profile calculation before and after heat treatment
・ Multi-layer structure calculation
Optimization of film thickness such as SiO2
However, the simulation does not guarantee the profile or concentration after implantation.
| 価格情報 |
****** Please feel free to contact us about fee of implantation service. |
|---|---|
| 納期 |
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| 用途／実績例 | We support many universities, institutes and corporates for implantation projects. |
取扱企業Implantation Simulation
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1.受託物理分析 2.イオン注入加工
Implantation Simulationへのお問い合わせ
お問い合わせ内容をご記入ください。
